PATTERN FORMING MATERIAL AND FORMATION OF PATTERN USING THE SAME

PROBLEM TO BE SOLVED: To improve the dimensional accuracy at the formation pattern by containing an alkali soluble high polymer, a tertiary alcohol having hydroxide group on carbons directly bonded to an aromatic ring, an acid precursor generating an acid by the irradiation with radial ray and a specific organic salt to suppress the dispersion of the sensitivity with respect to the temp. distribution generated on a wafer face at the time of heating after the irradiation with radial ray. SOLUTION: The alkali soluble high polymer, the tertiary alcohol having hydroxide group on the carbons directly bonded to the aromatic ring, the acid precursor generating the acid by the irradiation with radial ray and at least one kind of the organic salt selected from a group expressed by formula or the like are contained. In the formula, each of R1 -R3 represents hydrogen, an atom or an atomic group selected from a 1-7C linear or branched (substituted) alkyl group, phenyl group, benzyl group. R1 -R3 can be the same as or different from each other. X represents an anion selected from a group consisting of halogen, hexafluoroantimonate and the like.