RESIST COMPOSITION FOR FORMING COLORED IMAGE

PROBLEM TO BE SOLVED: To obtain a resist compsn. having satisfactory sensitivity and giving a transparent colored image having high light transmissivity even when a mask which does not sufficiently transmit light of

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Bibliographische Detailangaben
Hauptverfasser:	NAKAGAWA HIROYA, HOZUMI SHIGEO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a resist compsn. having satisfactory sensitivity and giving a transparent colored image having high light transmissivity even when a mask which does not sufficiently transmit light of