SEMICONDUCTOR WAFER TRANSFER SYSTEM

PROBLEM TO BE SOLVED: To prevent a semiconductor wafer from increasing in transfer time by a method, wherein high stokers where semiconductor wafers in production process are housed are arranged at each of semiconductor treating processes, semiconductor wafers required to be subjected to semiconduct...

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Bibliographische Detailangaben
Hauptverfasser: WAKIYAMA FUMITOSHI, NUMATA SHIGEO, SHIMAMURA HIDEAKI, SHIMIZU MICHIYUKI, TSUBOI RYUNOSUKE, SAKURADA TADAHIRO, OKABE TSUTOMU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent a semiconductor wafer from increasing in transfer time by a method, wherein high stokers where semiconductor wafers in production process are housed are arranged at each of semiconductor treating processes, semiconductor wafers required to be subjected to semiconductor treating processes are supplied to the high stokers, and the semiconductor wafers subjected to a semiconductor treatment are housed in the high stocker. SOLUTION: A semiconductor wafer transfer system is equipped with loop- type transfer lines 1a and 1b provided in a clean room 4a and loop-type transfer lines 1c and 1d provided on the ceiling 4b of the clean room 4a making right angles with the transfer lines 1a and 1b, whereby delays in the transfer of the semiconductor wafers can be lessened reducing a transfer lead time for any transfer carried out between loop lines to an irreducible minimum. Furthermore, even if three or more loop-type transfer lines are provided inside the clean room 4a on a request for a higher transfer capacity, one or more loop-type transfer lines are provided on the ceiling 4b of the clean room 4a, making right angles with the transfer lines which have been previously provided inside the clean room 4a, whereby delays in transfer of the semiconductor wafers between any loop-type transfer lines can be lessened.