SUBSTRATE TREATMENT DEVICE

PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of preventing lowering of a treatment quality due to uneven drying of the substrate. SOLUTION: A substrate carrier device 21 is provided with a running member 23 capable of reciprocating running in the X-direction, a supporting me...

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Bibliographische Detailangaben
1. Verfasser: HAYASHI TOKUYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of preventing lowering of a treatment quality due to uneven drying of the substrate. SOLUTION: A substrate carrier device 21 is provided with a running member 23 capable of reciprocating running in the X-direction, a supporting member 24 capable of vertically traveling to the running member 23 and a pair of chucks 25 supported by a supporting member 24. A pair of the chuck members 25 have a pair of rotary axes 26 allowing pivotal rotation on the respective supporting members 24, supporting rods 27 hanging from a pair of pivots 26 and substrates holding rods 28 installed between the supporting rods 27. Holding grooves for holding side edges of a plurality of substrates W are notched on the respective holding rods 28. Then, a pair of covers 30 are provided on a pair of rotary axes 26 for covering the upper part of the substrate W held by the chucks and shielding an air current due to a down flow.