METHOD FOR FEEDING CHEMICAL FLUID AND ITS DEVICE

PROBLEM TO BE SOLVED: To eliminate irregular treatment of surface and to decrease amt. of consumption of chem. fluid in the surface treatment of a base sheet. SOLUTION: The surface of a base sheet S is treated with a chem. fluid by a method wherein while the chem. fluid L is fed toward the base shee...

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Bibliographische Detailangaben
Hauptverfasser:	SAITO HIROYUKI, TAKATSUDO KAZUYUKI, KINAMI HARUYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To eliminate irregular treatment of surface and to decrease amt. of consumption of chem. fluid in the surface treatment of a base sheet. SOLUTION: The surface of a base sheet S is treated with a chem. fluid by a method wherein while the chem. fluid L is fed toward the base sheet S from a chem. fluid feeding nozzle 1 covering the whole width of the base sheet S and arranged in the direction intersecting in the moving direction, the chem. fluid feeding nozzle 1 is moved relatively to the base sheet S from the starting end to the terminal end of the base sheet S to feed the chem. fluid L on the surface of the base sheet S. As the whole surface of the base sheet S is uniformly treated so as to uniformly pile up the chem. fluid L on the whole width of the base sheet S and from the starting end to the terminal end thereof, fluctuation of the surface treatment as before is not generated.