PENTAPHENOL-BASED COMPOUND AND USE THEREOF

PROBLEM TO BE SOLVED: To obtain a new pentaphenol-based compound useful as a photosensitizer capable of providing a resist composition for the submicron lithography of semiconductors, excellent in sensitivity and resolving power and well balanced in resist various performances without any development residue or a precursor thereof. SOLUTION: This pentaphenol-based compound is represented by formula I (R is H or CH3 ; Q to Q are each H, 1,2-naphthoquinone diazido-4-sulfonyl or 1,2-naphthoquinone diazido-5-sulfonyl), e.g. 2,4-bis[4-hydroxy-3-(2-hydroxy-5- methylbenzyl)-2,5-dimethylbenzyl]-3,6-dimethylphenol. The compound represented by formula I is obtained by reacting a compound represented by formula II with p-cresol and then, as necessary, reacting the resultant compound with a 1,2-naphthoquinone diazido-4-sulfonyl halide or a 1,2-naphthoquinone diazido-5- sulfonyl halide.