POLYCRYSTALLINE SEMICONDUCTOR THIN FILM AND FORMING METHOD THEREOF, POLYCRYSTALLINE SEMICONDUCTOR TFT, AND TFT SUBSTRATE

PROBLEM TO BE SOLVED: To form a polycrystalline silicon semiconductor TFT of high performance. SOLUTION: A strip of polycrystalline silicon semiconductor thin film where crystal grains 20 are formed as stripes arranged in the scanning direction of a high-speed annealing beam, wherein an electric fie...

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Bibliographische Detailangaben
Hauptverfasser: KEYAKIDA MASAYA, MASUSHIGE KUNIO
Format: Patent
Sprache:eng
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