POLYCRYSTALLINE SEMICONDUCTOR THIN FILM AND FORMING METHOD THEREOF, POLYCRYSTALLINE SEMICONDUCTOR TFT, AND TFT SUBSTRATE
PROBLEM TO BE SOLVED: To form a polycrystalline silicon semiconductor TFT of high performance. SOLUTION: A strip of polycrystalline silicon semiconductor thin film where crystal grains 20 are formed as stripes arranged in the scanning direction of a high-speed annealing beam, wherein an electric fie...
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creator | KEYAKIDA MASAYA MASUSHIGE KUNIO |
description | PROBLEM TO BE SOLVED: To form a polycrystalline silicon semiconductor TFT of high performance. SOLUTION: A strip of polycrystalline silicon semiconductor thin film where crystal grains 20 are formed as stripes arranged in the scanning direction of a high-speed annealing beam, wherein an electric field effect mobility νL in the scanning direction and an electric field effect mobility νs in the widthwise direction of the strip are so set as to satisfy formulas, νL>=1.5.νs and νL->=55cm / V.s respectively, and the channel direction of a TFT is set conforming to the scanning direction of the annealing beam. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH1065180A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH1065180A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH1065180A3</originalsourceid><addsrcrecordid>eNrjZKgI8PeJdA6KDA5x9PHx9HNVCHb19XT293MJdQ7xD1II8fD0U3Dz9PFVcPRzUXDzD_L19HNX8HUN8fB3AUq6Brn6u-koEDDDLUQHrB3IUAgOdQoOCXIMceVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAR6GBmamhhYGjsZEKAEAocE6dQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POLYCRYSTALLINE SEMICONDUCTOR THIN FILM AND FORMING METHOD THEREOF, POLYCRYSTALLINE SEMICONDUCTOR TFT, AND TFT SUBSTRATE</title><source>esp@cenet</source><creator>KEYAKIDA MASAYA ; MASUSHIGE KUNIO</creator><creatorcontrib>KEYAKIDA MASAYA ; MASUSHIGE KUNIO</creatorcontrib><description>PROBLEM TO BE SOLVED: To form a polycrystalline silicon semiconductor TFT of high performance. SOLUTION: A strip of polycrystalline silicon semiconductor thin film where crystal grains 20 are formed as stripes arranged in the scanning direction of a high-speed annealing beam, wherein an electric field effect mobility νL in the scanning direction and an electric field effect mobility νs in the widthwise direction of the strip are so set as to satisfy formulas, νL>=1.5.νs and νL->=55cm / V.s respectively, and the channel direction of a TFT is set conforming to the scanning direction of the annealing beam.</description><edition>6</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FREQUENCY-CHANGING ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; PHYSICS ; SEMICONDUCTOR DEVICES ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>1998</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980306&DB=EPODOC&CC=JP&NR=H1065180A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980306&DB=EPODOC&CC=JP&NR=H1065180A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KEYAKIDA MASAYA</creatorcontrib><creatorcontrib>MASUSHIGE KUNIO</creatorcontrib><title>POLYCRYSTALLINE SEMICONDUCTOR THIN FILM AND FORMING METHOD THEREOF, POLYCRYSTALLINE SEMICONDUCTOR TFT, AND TFT SUBSTRATE</title><description>PROBLEM TO BE SOLVED: To form a polycrystalline silicon semiconductor TFT of high performance. SOLUTION: A strip of polycrystalline silicon semiconductor thin film where crystal grains 20 are formed as stripes arranged in the scanning direction of a high-speed annealing beam, wherein an electric field effect mobility νL in the scanning direction and an electric field effect mobility νs in the widthwise direction of the strip are so set as to satisfy formulas, νL>=1.5.νs and νL->=55cm / V.s respectively, and the channel direction of a TFT is set conforming to the scanning direction of the annealing beam.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FREQUENCY-CHANGING</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1998</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZKgI8PeJdA6KDA5x9PHx9HNVCHb19XT293MJdQ7xD1II8fD0U3Dz9PFVcPRzUXDzD_L19HNX8HUN8fB3AUq6Brn6u-koEDDDLUQHrB3IUAgOdQoOCXIMceVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAR6GBmamhhYGjsZEKAEAocE6dQ</recordid><startdate>19980306</startdate><enddate>19980306</enddate><creator>KEYAKIDA MASAYA</creator><creator>MASUSHIGE KUNIO</creator><scope>EVB</scope></search><sort><creationdate>19980306</creationdate><title>POLYCRYSTALLINE SEMICONDUCTOR THIN FILM AND FORMING METHOD THEREOF, POLYCRYSTALLINE SEMICONDUCTOR TFT, AND TFT SUBSTRATE</title><author>KEYAKIDA MASAYA ; MASUSHIGE KUNIO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH1065180A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1998</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FREQUENCY-CHANGING</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>KEYAKIDA MASAYA</creatorcontrib><creatorcontrib>MASUSHIGE KUNIO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KEYAKIDA MASAYA</au><au>MASUSHIGE KUNIO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLYCRYSTALLINE SEMICONDUCTOR THIN FILM AND FORMING METHOD THEREOF, POLYCRYSTALLINE SEMICONDUCTOR TFT, AND TFT SUBSTRATE</title><date>1998-03-06</date><risdate>1998</risdate><abstract>PROBLEM TO BE SOLVED: To form a polycrystalline silicon semiconductor TFT of high performance. SOLUTION: A strip of polycrystalline silicon semiconductor thin film where crystal grains 20 are formed as stripes arranged in the scanning direction of a high-speed annealing beam, wherein an electric field effect mobility νL in the scanning direction and an electric field effect mobility νs in the widthwise direction of the strip are so set as to satisfy formulas, νL>=1.5.νs and νL->=55cm / V.s respectively, and the channel direction of a TFT is set conforming to the scanning direction of the annealing beam.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
title | POLYCRYSTALLINE SEMICONDUCTOR THIN FILM AND FORMING METHOD THEREOF, POLYCRYSTALLINE SEMICONDUCTOR TFT, AND TFT SUBSTRATE |
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