CLEAN BENCH FOR SUBSTRATE TREATMENT EQUIPMENT

PROBLEM TO BE SOLVED: To supply clean air to a wafer treatment equipment which removes alkali components, such as ammonia and the like, generated in the treatment equipment and cleaning the air without the use of chemical filters. SOLUTION: Air, recovered from an equipment for treating resist, is ta...

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Bibliographische Detailangaben

Hauptverfasser:	SENBA NORIO, KITANO JUNICHI, KATANO TAKAYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION TRANSPORTING
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