CLEAN BENCH FOR SUBSTRATE TREATMENT EQUIPMENT

PROBLEM TO BE SOLVED: To supply clean air to a wafer treatment equipment which removes alkali components, such as ammonia and the like, generated in the treatment equipment and cleaning the air without the use of chemical filters. SOLUTION: Air, recovered from an equipment for treating resist, is taken from an intake 111 and flows from down to up in an air flow path. A first impurity removal section 130 and a second impurity removal section 150 are arranged above and below in a multistage. Pure water from spray nozzles 131a and 151a is sprayed uniformly to distribution mats 132 and 152 via air- water contact spaces M1 and M2 , and seeps uniformly into the distribution mats 132 and 152. The recovered air makes contact with the pure water in the distribution mats 132 and 152 and the air-water contact spaces M1 and M2 , and impurities such as alkali component and the like are removed.