LEED FRAME ALIGNER

PROBLEM TO BE SOLVED: To provide a leed frame aligner positioning etching material and an exposure mask while securing exposure accuracy in a direction perpendicular to a carrying direction. SOLUTION: In this device, edge sensors 9a and 9c are fixed on one side in the carrying direction of the same...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SASAKI TOMOHIRO, TOGASHI MASAMICHI, KAJIWARA MAKOTO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a leed frame aligner positioning etching material and an exposure mask while securing exposure accuracy in a direction perpendicular to a carrying direction. SOLUTION: In this device, edge sensors 9a and 9c are fixed on one side in the carrying direction of the same horizontal plane as the etching material 1 at two spots astern and ahead of an exposing position in the carrying direction, and measures a distance perpendicular to the carrying direction to the side surface of the etching material. Positional deviation (meandering amount) Y1 in a direction Y and rotational amount θ1 are obtained from measured amounts La, Lc, Lb and Ld by the edge sensors 9a and 9c and the edge sensors 9b and 9d fixed in the carrying direction by a carrying distance by respectively calculating expressions Y1=(La-Lc)/2+(Lb-Ld)/2 and θ1=tan (La-Lb-Lc+ Ld)/P so as to move and rotate the exposure mask 3 by compensating mechanisms 10 and 11.