SURFACE TREATMENT DEVICE FOR GRAVURE CYLINDER

PROBLEM TO BE SOLVED: To provide a device which is capable of rapidly discharging a treating liquid and is small in size and low in cost by disposing a valve disk which opens and closes the liquid drain port disposed at the bottom of a treating vessel and disposing opening/closing means for opening...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: USUDA HITOSHI, WATANABE SHIGEYUKI, SAKAMAKI SEIJI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a device which is capable of rapidly discharging a treating liquid and is small in size and low in cost by disposing a valve disk which opens and closes the liquid drain port disposed at the bottom of a treating vessel and disposing opening/closing means for opening and closing this valve disk on the outside of this treating vessel. SOLUTION: When the surface treatment of a gravure cylinder 1 ends within the treating vessel 10, the air cylinder 21 of the opening/closing means 20 operates to push up the valve disk 26 toward an alternate long and two short dashes line from a solid line state through the liquid drain port 12 via a connecting rod 23. This time is the time of the max. load on the opening/closing means 20 and, if the liquid drain port 12 is opened even slightly, the closing force by the treating liquid pressure is released. Then, the load is small thereafter and, therefore, the valve disk may be rapidly opened by the stable opening action. The rapid discharge to drastically shorten the discharge time of the treating liquid Q to a retaining tank 15 for the liquid Q may be executed by forming the liquid drain port 12 to a larger diameter and eventually the productivity and the surface treatment quality are improved.