FORMATION OF PATTERN AND SURFACE-TREATING AGENT

PROBLEM TO BE SOLVED: To improve the adhesion between a semiconductor substrate and a resist pattern by forming a resist film on the surface of the substrate after the surface is treated with a surface treating agent containing a specific silane compound and the resist pattern by exposing and develo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ENDO MASATAKA, OSAKI HIROMI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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