RESIST APPLYING DEVICE

PROBLEM TO BE SOLVED: To form a uniform coating film on a glass substrate by maintaining the liquid level of a resist filled in a receiving tray constant. SOLUTION: The receiving tray 4 is provided with an auxiliary liquid tank 9 for detecting a liquid level height communicated with the receiving tr...

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Bibliographische Detailangaben
Hauptverfasser:	SHIBA MITSUAKI, IMABAYASHI YOSHITAKA, YANASE HIROYASU, ICHIMURA YUKIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To form a uniform coating film on a glass substrate by maintaining the liquid level of a resist filled in a receiving tray constant. SOLUTION: The receiving tray 4 is provided with an auxiliary liquid tank 9 for detecting a liquid level height communicated with the receiving tray 4. A float 10 formed with a white plane atop the float is floated within the auxiliary liquid tank 9. The white plane as a target is irradiated with a laser beam from a light reflection sensor 11 and the liquid level height is detected by the reflected light thereof. A resist replenishing device is activated in accordance with the detected liquid level height signal, by which the liquid level of the resist soln. of the receiving tray 4 is maintained constant.