CVD EQUIPMENT AND CVD METHOD

PROBLEM TO BE SOLVED: To improve the yield of products by reducing particles sticking to a wafer. SOLUTION: An in-line particle monitor 17 is installed in piping 16 for monitoring particles which is fixed to a reaction furnace 1. Particles formed in the course of reaction in the reaction furnace 1 a...

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1. Verfasser:	MORI KENZO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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