METHOD OF EXPOSURE

PROBLEM TO BE SOLVED: To minify dispersion of line widths of chip patterns resulting from the time difference of exposure shot on the same substrate of chemically amplified resist film and to improve chip yield obtained from the periphery of substrate. SOLUTION: Exposure energy is varied for every s...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KOIZUMI TAICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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