THERMAL RECORDING MATERIAL

PROBLEM TO BE SOLVED: To form a smooth film having high gloss without requiring dilution with an organic solvent or emulsification by employing a radiation curing resin composition containing a specified resin as an overcoat layer. SOLUTION: A radiation curing resin composition containing an amine m...

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Bibliographische Detailangaben
Hauptverfasser: NOZAKI MAKOTO, TAKAHASHI TAKESHI, KOGO MAKIKO, YOSHIOKA KANICHIRO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To form a smooth film having high gloss without requiring dilution with an organic solvent or emulsification by employing a radiation curing resin composition containing a specified resin as an overcoat layer. SOLUTION: A radiation curing resin composition containing an amine modified resin A having an ethylene unsaturation group and a resin B having three or more ethylene unsaturation groups in a molecule is employed as an overcoat layer. The resins A and B are preferably contained by 2-80wt.%, more preferably by 10-60wt.%, for the total composition. Sufficient performance can not be expected for lower content and film cracking may take place for higher content. Furthermore, the radiation curing resin composition may contain a tiller or a slip agent in order to enhance the performance for preventing adhesion of refuse to a thermal head and the sticking thereof.