RESIST COATING METHOD ON METAL THIN PLATE AND RESIST COATING DEVICE

PROBLEM TO BE SOLVED: To prevent production of colonies of bacteria in a resist tank, to uniformly apply a resist on the principal surface of a metal thin plate without causing film defects, and to form a good coating film by irradiating a washing liquid with UV rays to sterilize the washing liquid...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ARIYAMA DAISAKU, TAMURA TOSHIO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To prevent production of colonies of bacteria in a resist tank, to uniformly apply a resist on the principal surface of a metal thin plate without causing film defects, and to form a good coating film by irradiating a washing liquid with UV rays to sterilize the washing liquid before the liquid is supplied to the principal surface of the metal thin plate. SOLUTION: A washing water subjected to sterilization treatment by a UV sterilization device is supplied from a washing water supply device through a water supply tube 28 to a shower nozzle 26 of a washing part 10. The water is sprayed by the shower nozzle 26 onto the principal surface of a metal thin plate 16 to wash the principal surface of the metal thin plate 16. Even when the metal thin plate 16 on which the washing water is remained is dipped in a resist 34 in a resist tank 32 of a resist coating part 14, no bacteria is brought into the resist tank 32 and no bacteria grows because the washing water is sterilized.