PRODUCTION OF PATTERN-DYEING PRODUCT

PROBLEM TO BE SOLVED: To give a dyeing pattern of high resolution on a polymer thin film by partially irradiating a polymer thin film containing a quinone and a polymer bearing functional groups which form amino group by irradiation with light and dyeing the irradiated thin film. SOLUTION: A polymer...

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Bibliographische Detailangaben
Hauptverfasser: KADOOKA MASAHIRO, SUYAMA HIROSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To give a dyeing pattern of high resolution on a polymer thin film by partially irradiating a polymer thin film containing a quinone and a polymer bearing functional groups which form amino group by irradiation with light and dyeing the irradiated thin film. SOLUTION: A polymer thin layer 1 containing, as effective components, quinone and a polymer substance bearing functional groups forming amino groups by irradiation with light, for>r example, a functional group of the formula: COO-N=CR1 R2 (R1 and R2 are independently an alkyl, an aryl, H) is partially irradiated with light through a photo-mask 3. The polymer thin layer having the parts where amino groups are liberated by light irradiation is dyed to give the objective pattern-dyed product having the dyed parts 5. Since the shape of the thin film is not deformed even after dyeing, this is useful in production of color filters.