PRODUCTION OF POTASSIUM FLUOROALUMINATE, POTASSIUM FLUOROALUMINATE AND FLUX SOLDERING ALUMINUM

PROBLEM TO BE SOLVED: To obtain the subject compd. having a lower m.p. than the conventional one by allowing Al(OH)3 , HF and KOH to undergo a reaction under specified conditions to deposit a potassium fluoroaluminate having a specified m.p. SOLUTION: Al(OH)3 , HF and KOH are allowed to react in a l...

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Bibliographische Detailangaben
Hauptverfasser: RUDOLPH WERNER DR, SANDER RUEDIGER, BELT HEINZ-JOACHIM DR
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To obtain the subject compd. having a lower m.p. than the conventional one by allowing Al(OH)3 , HF and KOH to undergo a reaction under specified conditions to deposit a potassium fluoroaluminate having a specified m.p. SOLUTION: Al(OH)3 , HF and KOH are allowed to react in a liq. medium (e.g. water) in 1:5±0.2:2±0.05, preferably 1:5±0.1:2±0.05, molar ratio of Al:F:K preferably at 60 deg.C to the b.p. of the reaction mixture, the reaction product is dried at 80 deg.C in vacuum, and a potassium fluoroaluminate having 546-550 deg.C m.p. measured by DSC is deposited. The deposited potassium fluoroaluminate is separated from the liq. medium and dried. This potassium fluoroaluminate is excellently used as the flux in soldering Al because of its low m.p.