OPTICAL EXPOSURE SYSTEM

PROBLEM TO BE SOLVED: To facilitate maintenance and management of an exposure system by preventing deterioration of optical components through which ultraviolet rays for exposure are passed, such as a condenser, a reflecting mirror, a lens, and a photo mask. SOLUTION: A surface coating 2 is applied...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	OKADA IKUO, MATSUDA KOREHITO, SEKIMOTO MISAO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To facilitate maintenance and management of an exposure system by preventing deterioration of optical components through which ultraviolet rays for exposure are passed, such as a condenser, a reflecting mirror, a lens, and a photo mask. SOLUTION: A surface coating 2 is applied on the surface of a lens 1, and a catalyst film 3 is arranged thereon. The surface coating 2 is a multilayer film coating formed to eliminate reflection of light. The catalyst film 3 is made of titanium dioxide. When the catalyst film is irradiated with a light having an energy not lower than the band gap energy (approximately 3.2eV) of titanium dioxide, it is excited and intense oxidation and reduction are generated on the surface.