PRODUCTION OF ELECTRODE PLATE FOR COLOR DISPLAY DEVICE

PROBLEM TO BE SOLVED: To establish the production technique of an electrode plate for a color display for which a silicon dioxide thin film heretofore used generally between a color filter or org. protective inorg. film is not used. SOLUTION: When the color filter(CF) or overcoat(OC) which is an org...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: NAKAI HIDEMI, OGATA KIYOSHI, INOUE DAISUKE, NAKAMURA NOBUYUKI, TOYOSHIMA TAKAYUKI, YAMAOKA TOMONORI, MAEKAWA HARUO, MIKAMI TAKASHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To establish the production technique of an electrode plate for a color display for which a silicon dioxide thin film heretofore used generally between a color filter or org. protective inorg. film is not used. SOLUTION: When the color filter(CF) or overcoat(OC) which is an org. resin layer is irradiated with oxygen ions or argon ions, the stains on the surface are removed by an etching effect and carbide layers are formed at least partially on the CF or OC and the chemical resistance of the layer surface of the CF or OC is improved and the adhesion property to the transparent electrode formed thereon is improved as well. The materials of the CF (or OC) are preferably org. resins and above all, acrylic resins.