EXPOSURE DEVICE AND EXPOSURE METHOD BY USING THAT DEVICE

PROBLEM TO BE SOLVED: To provide an improved aligner, a method using the device and an exposure method having a system combining a quadrupole exposure system with a circular exposure system. SOLUTION: A filter 6b limiting light from a light source, a condenser lens 6c refracting and diffracting ligh...

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Bibliographische Detailangaben
Hauptverfasser:	SOU ZAIKAN, BOKU YOSHINOBU, KIN TEIKON, BAE KIYOUSEI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an improved aligner, a method using the device and an exposure method having a system combining a quadrupole exposure system with a circular exposure system. SOLUTION: A filter 6b limiting light from a light source, a condenser lens 6c refracting and diffracting light from the filter 6b, a mask 6d and a lens 6e focusing light from the mask 6d on a wafer 6f are provided. The filter 6b provides with first group holes including four holes and with second group holes. These can maintain higher resolution than a conventional deformed aligner and can form a distribution of averaged light strength on an image forming plate (or on a wafer). Also a contact hole pattern with a nearly circular form can be formed and the proximity effect can be shortened by image forming information, which is included in the light passing through the mask pattern, being averaged.