PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD USING SAME

PROBLEM TO BE SOLVED: To form a high resolution pattern by incorporating an alkali-soluble polymer, an acid precursor forming halogen acid when irradiated with active chemical rays and a specified onium compd. SOLUTION: This pattern forming material contains an alkali-soluble polymer, an acid precur...

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Bibliographische Detailangaben

Hauptverfasser:	UTAKA SONOKO, UCHINO MASAICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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