POLYPROPYLENE COMPOSITION AND USE THEREOF

PROBLEM TO BE SOLVED: To provide a polypropylene compsn. which has excellent mechanical strength and transparency, is less likely to become fragile upon radiation exposure and less likely to be colored and to provide a pharmaceutical for radiation sterilization and molding for medical applications c...

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Bibliographische Detailangaben
Hauptverfasser:	FUTAMI YASUO, HIU TOYOAKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DISINFECTION, STERILISATION, OR DEODORISATION OF AIR HUMAN NECESSITIES HYGIENE MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES MEDICAL OR VETERINARY SCIENCE METALLURGY METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a polypropylene compsn. which has excellent mechanical strength and transparency, is less likely to become fragile upon radiation exposure and less likely to be colored and to provide a pharmaceutical for radiation sterilization and molding for medical applications comprising the polypropylene compsn. SOLUTION: This polypropylene compsn. comprises: 75 to 94wt.% polypropylene (A) having a content of an ethylene-derived unit of 2.5 to 6mol% and an MFR of 5 to 50g/10min; 5 to 15wt.% straight-chain, low-density polyethylene (B) having a density of 0.905 to 0.919g/cm , a degree of crystallization of not less than 30%; 1 to 10wt.% ethylene/-1-butene copolymer (C) having a degree of crystallization of less than 30%; and, based on 100 pts.wt. in total of the components (A) to (C), 0.0001 to 0.05 polymer nucleating agent (D), 0.01 to 1.0 pts.wt. org. nucleating agent (E) having a mol.wt. of not more than 1,000, 0.01 to 1.0 pts.wt. org. phosphorus-based heat-resistant stabilizer (F), and 0.01 to 1.0 pts.wt. hindered amine photostabilizer (G).