PENTAPHENOL-BASED COMPOUND AND ITS USE

PROBLEM TO BE SOLVED: To obtain a new compound useful as a sensitizing agent for resists or its precursor. SOLUTION: This new compound is expressed by the formula (R to R are each H, or 1,2-naphthoquinone-diazide-4- or -5-sulfonyl), e.g., 2,6-bis[4- hydroxy-3-(4-hydroxy-2,5-dimethylbenzyl)-5-methylb...

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Bibliographische Detailangaben
Hauptverfasser:	OZAKI HARUKI, INOUE HIROTAKA
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a new compound useful as a sensitizing agent for resists or its precursor. SOLUTION: This new compound is expressed by the formula (R to R are each H, or 1,2-naphthoquinone-diazide-4- or -5-sulfonyl), e.g., 2,6-bis[4- hydroxy-3-(4-hydroxy-2,5-dimethylbenzyl)-5-methylbenzyl]-4-methylphenol. The compound is obtained by reacting 2,6-bis(4-hydroxy-3-hydroxymethyl-5- methylbenzyl)-4-methylphenol with 2,5-xylenol. A resist composition containing a sensitizing agent which is obtained by converting the compound into its 1,2- naphthoquinone-diazide-sulfonic acid ester is excellent in sensitivity and resolution as a fine processing agent of semiconductors, leaves no development residue and has a good balance in resisting functions.