RESIST REMOVING DEVICE

PROBLEM TO BE SOLVED: To provide a simple, inexpensive resist removing device used in a semiconductor manufacturing process by which edge rinse is carried out, an orientation flat part included, in a spin cup of a spin coater and in a short time. SOLUTION: A resist removing device having an edge rin...

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Bibliographische Detailangaben
1. Verfasser:	NOHAMA SHIYOUJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS NOZZLES PERFORMING OPERATIONS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a simple, inexpensive resist removing device used in a semiconductor manufacturing process by which edge rinse is carried out, an orientation flat part included, in a spin cup of a spin coater and in a short time. SOLUTION: A resist removing device having an edge rinse nozzle E for spouting a rinse liquid for washing and removing an unnecessary resist collected in the peripheral part of a wafer W held and rotated by a holding and rotating means 1 is provided with an edge nozzle parallel driving means 4 for linearly moving the edge nozzle E parallel to the diameter direction of the wafer W, a detecting means for detecting a notch part (orientation flat part) provided on the wafer, and a control means for moving the edge rinse nozzle parallel driving means 4 along the straight line of the notch part provided on the wafer according to the detected results of the detecting means.