WASTE GAS TREATING DEVICE

PROBLEM TO BE SOLVED: To provide a waste gas treating device by which waste gas is uniformly irradiated with electron beams and much installing space is not required. SOLUTION: Electron beam irradiation devices 3A, 3B are arranged on one side of a waste gas duct, separated from each other. In a part...

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Bibliographische Detailangaben
1. Verfasser: MIZUSAWA KENICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a waste gas treating device by which waste gas is uniformly irradiated with electron beams and much installing space is not required. SOLUTION: Electron beam irradiation devices 3A, 3B are arranged on one side of a waste gas duct, separated from each other. In a part corresponding to between electron beam irradiation devices 3A, 3B of the waste gas duct 2, reversing guides 11A, 11B by which waste gas passing near the electron beam irradiation device 3A is reversed so that it may flow a distance from the device 3A until it reaches the electron beam irradiation device 3B and on the other hand, waste gas 5B flowing a distance from the electron beam irradiation device 3A is reversed so that in may flow near the device 3A until it reaches the electron beam irradiation device 3B are installed. And also in the waste gas duct 2 near the electron beam irradiation devices 3A, 3B on the upstream side thereof, reaction product sprayers 12A, 12B whose opening quantity is adjusted so that the jetted quantity of a reaction product 6 may be increased as they approach the electron beam irradiation devices 3A, 3B.