SAMPLE EVAPORATOR

PROBLEM TO BE SOLVED: To obtain rapidly a stable amount of beam by rapidly and positively heating sample without changing PID(proportional, integral, differential) control during course. SOLUTION: A spacer 9 is provided between an oven 3 and a thermo-couple 8 for temporally delaying the heat conduct...

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Bibliographische Detailangaben
1. Verfasser:	SENOO KAZUHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain rapidly a stable amount of beam by rapidly and positively heating sample without changing PID(proportional, integral, differential) control during course. SOLUTION: A spacer 9 is provided between an oven 3 and a thermo-couple 8 for temporally delaying the heat conduction from the oven 3. When measuring the temperature of the oven 3 through the spacer 9, the heat of the oven 3 is not instantly transferred to the thermo-couple 8 so that the response of the thermo-couple 8 will be slow. Thus when heating the oven 3, the actual oven temperature may be higher than the measured temperature of the thermo-couple 8. Since the oven temperature is controlled according to the measured temperature of the thermo-couple 8, if the heating of oven 3 is suppressed based on the measured temperature, the oven 3 itself will be sufficiently heated at that time so that the sample 5 in the oven 3 also will be sufficiently heated.