POLISHING DEVICE

PROBLEM TO BE SOLVED: To simplify a mechanism, reduce scattering of a washing fluid, effectively clean a top ring lower surface, so that a conveying hand and a polished workpiece can be cleaned. SOLUTION: This washing mechanism 30, in a polishing device polishing a polished workpiece, advances to th...

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Bibliographische Detailangaben
Hauptverfasser:	NISHI TOYOMI, TOGAWA TETSUJI
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To simplify a mechanism, reduce scattering of a washing fluid, effectively clean a top ring lower surface, so that a conveying hand and a polished workpiece can be cleaned. SOLUTION: This washing mechanism 30, in a polishing device polishing a polished workpiece, advances to the downward of a top ring 20 in a condition waiting in a specified position, and injectes a washing fluid, to a lower surface of the top ring 20 for cleaning. Other wise, washing mechanism 30 is provided in a specified position of a table dome covering an upper part specified range of a turn table 10 to prevent a fluid from scattering to the outside, and is constituted so as to wash a lower surface of the top ring in standby in a specified position.