PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING SAME

PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. excellent in following property and adhesion even to a substrate having high surface roughness and not causing ooze from the edge faces of a roll when a photosensitive element using the compsn. is fed as the roll. SOLUTION: This resin co...

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Bibliographische Detailangaben
Hauptverfasser:	SAWABE MASARU, MASAOKA KAZUTAKA, ABE MITSUYOSHI, TACHIKI HIDEYASU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. excellent in following property and adhesion even to a substrate having high surface roughness and not causing ooze from the edge faces of a roll when a photosensitive element using the compsn. is fed as the roll. SOLUTION: This resin compsn. contains a film forming polymer made of a vinyl copolymer having carboxyl groups, a crosslinking agent having an ethylenic unsatd. bond and a photopolymn. reaction initiator which generates free radicals under active rays. The film forming polymer has 30-80 deg.C crystallization temp. and contains a crystalline graft polymer obtd. by copolymerizing a macromonomer having one polymerizable unsatd. group at one terminal of a polymer of an alkyl (meth)acrylate represented by the formula [where R is H or methyl and (n) is an integer of 12-24].