DETERGENT COMPOSITION

PROBLEM TO BE SOLVED: To obtain a safe mold-removing or cleaning agent which comprises a combination of a chelating agent with a semiconductor photocatalyst without occurrence of noxious material, for example, chlorine gas. SOLUTION: This mold-removing or cleaning agent contains, as essential compon...

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Bibliographische Detailangaben
1. Verfasser:	KAMIUSUKI TOSHIAKI
Format:	Patent
Sprache:	eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a safe mold-removing or cleaning agent which comprises a combination of a chelating agent with a semiconductor photocatalyst without occurrence of noxious material, for example, chlorine gas. SOLUTION: This mold-removing or cleaning agent contains, as essential components, (A) a chelating agent, preferably citric, oxalic acid, EDTA or their salt) and (B) a semiconductor photocatalyst (for example, titanium oxide, SnO2 , WO3 , SiO2 and Fe2 O3 , preferably titanium oxide). This composition is preferably applied in the form of an aqueous solution or dispersion. The proportion of component A is 0.1-50wt.%, preferably 5-20wt.%, while component B is 0.01-40wt.%, preferably 0.1-5wt.% in the composition.