APPARATUS AND METHOD FOR DRY ETCHING

PROBLEM TO BE SOLVED: To always stabilize the environment of a vacuum bell jar without being changed with a treatment by a method wherein the vacuum bell jar is heated in advance by using a temperature regulating mechanism so as to be stabilized at a temperature during the treatment or it is cooled...

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Bibliographische Detailangaben
Hauptverfasser:	OGURA TAKEISA, BITO YOJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To always stabilize the environment of a vacuum bell jar without being changed with a treatment by a method wherein the vacuum bell jar is heated in advance by using a temperature regulating mechanism so as to be stabilized at a temperature during the treatment or it is cooled so as to maintain a low temperature even during the treatment. SOLUTION: A heater 10 for heating is laid at a vacuum bell jar 2. That is to say, the temperature of the heater 10 is set so as to become the temperature of the vacuum bell jar 2 at the continuous treatment of a wafer 1. The temperature can be determined by an empirial rule. In addition, a temperature inside the vacuum bell jar 2 is measured by a thermocouple, and it is adjusted by a temperature regulator at the heater 10 so as to become within ±5 deg.C. In this manner, the heater 10 is attached to the circumference of the vacuum bell jar 2, and the vacuum bell jar 2 is heated to the temperature near a process temperature. Thereby, a stable etching characteristic can be obtained.