LIGHTING SYSTEM, EXPOSURE DEVICE AND MICROSCOPE DEVICE USING THE SYSTEM, AND DEVICE PRODUCTION

PROBLEM TO BE SOLVED: To simply, effectively remove unnecessary light by using a spectral element whose emitting angle is different by wave length. SOLUTION: Emitted light from an undulator radiation source 1 contains harmonic X-rays, continuous X-rays, and an ultraviolet ray in addition to fundamen...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	HAYASHIDA MASAMI, MIYAKE AKIRA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To simply, effectively remove unnecessary light by using a spectral element whose emitting angle is different by wave length. SOLUTION: Emitted light from an undulator radiation source 1 contains harmonic X-rays, continuous X-rays, and an ultraviolet ray in addition to fundamental X-rays. Pencil-like thin beam of the emitted light is reflected and magnified with a convex reflecting mirror 2, then reflected with a concave diffraction grating 3. The beam is incident to the diffraction grating 3 at about 88 deg., only the X-rays having a wave length of about 13nm are emitted in the reflection mask 4, and most light having wave length other than about 13nm is absorbed in the grating 3 and an absorbing body 7. By using the diffraction grating 3 having different emitting angle by wave length in an illuminating optical system, light in an ultraviolet or visible region of long wave length, emitted from the undulator radiation source 1 is reflected in the direction different from X-rays which are necessary for exposure to be separated, and drop in resolution in pattern transfer can be prevented.