MANUFACTURE OF LIQUID CRYSTAL DEVICE

PROBLEM TO BE SOLVED: To manufacture a liquid crystal device capable of forming a transparent electrode (ITO film) without causing any peeling or micro-cracks of a flattened layer by using a weak acid etching solution for patterning the transparent electrode. SOLUTION: In this manufacture, an ITO film 5 containing an amorphous component becoming a transparent electrode is formed on the flattened layer 4 being a color filter substrate by a sputtering method. Thereafter, this ITO film 5 is coated with a photoresist and the photoresist coating layer is subjected to light exposure and development to form a photoresist pattern 6. Then, the ITO film 5 on which the photoresist pattern 6 is formed is etched with a weak acid etching solution, then the photoresist pattern 6 is peeled off from the ITO film 5 to form a patterned transparent electrode 7 consisting of the ITO film 5. Since this weak acid etching solution causes no damage to the flattened layer 4 or color filters, the flattened layer 4 is prevented from being peeled off and micro-cracked and manufacturing yield can be improved.