RADIATION-SENSITIVE RECORDING MATERIAL FOR MANUFACTURE OF PLANOGRAPHIC PRINTING PLATE

PROBLEM TO BE SOLVED: To provide a radiation-sensitive recording material excellent in development resistance and chemical resistance. SOLUTION: This recording material consists of an aluminum base body and a radiation-sensitive layer formed on the base body. The base body is roughened and anodicall...

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Hauptverfasser:	ANDOREASU ERUZETSUSAA, RAIMUNTO HAASU, RUDORUFU NOIBAUAA, RUDORUFU TSUERUTANI, PEETAA REEMAN, GIYUNTAA FURUTSUTSUSHIYU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a radiation-sensitive recording material excellent in development resistance and chemical resistance. SOLUTION: This recording material consists of an aluminum base body and a radiation-sensitive layer formed on the base body. The base body is roughened and anodically oxidized and then made hydrophilic. The radiation- sensitive layer contains the following components (a) to (f). (a) Radiation- sensitive ester of 1,2-naphthoquinone-2-diazide-4-sulfonate and a polymerized condensate having phenol-type hydroxyl groups, (b) a novolac resin or a polymerized condensate of polyphenol and aldehyde or ketone as an alkali-soluble resin, (c) a vinyl polymer comprising a unit having hydroxyphenyl groups on side chains, (d) an inclusion compd., (e) a low mol.wt. comps. containing acid hydrogen atoms, and (f) silica gel particles having 15μm max. radius.