METHOD FOR REMOVING PHOTORESIST AND DEVICE THEREFOR

PROBLEM TO BE SOLVED: To prevent corrosion without forming unequal drying and unequal treating with a release liquid on a substrate by removing the release liquid from the surface of the substrate by flowing the air elected from an air nozzle to the substrate, then immediately washing the surface of...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SONOBE YUKIO, KUME SATOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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