METHOD FOR REMOVING PHOTORESIST AND DEVICE THEREFOR

PROBLEM TO BE SOLVED: To prevent corrosion without forming unequal drying and unequal treating with a release liquid on a substrate by removing the release liquid from the surface of the substrate by flowing the air elected from an air nozzle to the substrate, then immediately washing the surface of the substrate by rapid washing flow. SOLUTION: The surface of the substrate is washed with washing water 7 immediately after the release liquid 5 is removed by the blowing of the air. The air nozzle 3 inclines in a transporting direction by an angle θ1 with the normal 6 of the substrate and blows the air toward the upstream side. A water nozzle 4 is mounted in the position in sufficient proximity to the air nozzle 3 on the downstream side (transporting direction) to allow the air nozzle 3 to execute washing right after blowing of the air and is so inclined as to spray the washing water 7 in a perpendicular or transporting direction (arrow A direction). The water nozzle 4 is preferably disposed in the position apart by such a distance L1 at which the washing water 7 does not arrive at the wind pressure point 8 of the air nozzle 3.