SYSTEM AND METHOD FOR CONTROLLING SEMICONDUCTOR DEVICE MANUFACTURING PROCESS

PROBLEM TO BE SOLVED: To prevent the generation of defectives and the deterioration of quality by stopping the operation of a process execution device by an operation stand-by command when the back-up of process program information transmitted from the process execution device and information from a...

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Bibliographische Detailangaben
Hauptverfasser: KIN SOUUN, RI ZAIKIYOU, SAI SOUKOKU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent the generation of defectives and the deterioration of quality by stopping the operation of a process execution device by an operation stand-by command when the back-up of process program information transmitted from the process execution device and information from a main host computer differ. SOLUTION: A control system transmits preset wafer information to a host computer 20 as a PPID1 or PPID2 process. When the host computer 20 transmits a PPID value and an operation start command to a diffusion furnace 30 on the basis of a process command and information transmitted, a mode is set under an initialization state for conducting a program and the PPID value received is backed up to the host computer 20 in the diffusion furnace 30. The host computer 20 compares the backed-up PPID value with the transmitted PPID value, a separate command is not transmitted to the diffusion furnace 30 when both values coincide, and an operation stand-by command is transmitted to the diffusion furnace 30 and the progress of a process is stopped when both values do not agree.