HEXANUCLEAR NOVOLAC COMPOUND AND ITS PRODUCTION
PROBLEM TO BE SOLVED: To obtain a new compound useful as a raw material or an additive of a resist for the fine processing of a semiconductor. SOLUTION: The objective compound is expressed by the formula (one of R to R is OH, one of R to R is OH and the remaining R to R are each H, a 1-6C alkyl or O...
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| creator | ICHIKAWA KOJI OZAKI HARUKI |
| description | PROBLEM TO BE SOLVED: To obtain a new compound useful as a raw material or an additive of a resist for the fine processing of a semiconductor. SOLUTION: The objective compound is expressed by the formula (one of R to R is OH, one of R to R is OH and the remaining R to R are each H, a 1-6C alkyl or OH), e.g. 4,4'-methylenebis[2- 2-hydroxy-3-(2-hydroxybenzyl)-5- methylbenzyl}-3,6-dimethylphenol]. The compound can be produced by reacting 4,4'-methylenebis[2-(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-3,6- dimethylphenol] with a phenolic compound at a molar ratio of 1:(2-50) in the presence of an acidic catalyst. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH09110758A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH09110758A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH09110758A3</originalsourceid><addsrcrecordid>eNrjZND3cI1w9At19nF1DFLw8w_z93F0VnD29w3wD_VzUXAEYs-QYIWAIH-XUOcQT38_HgbWtMSc4lReKM3NoOjmGuLsoZtakB-fWlyQmJyal1oS7xXgYWBpaGhgbmrhaEyMGgAgACZn</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>HEXANUCLEAR NOVOLAC COMPOUND AND ITS PRODUCTION</title><source>esp@cenet</source><creator>ICHIKAWA KOJI ; OZAKI HARUKI</creator><creatorcontrib>ICHIKAWA KOJI ; OZAKI HARUKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To obtain a new compound useful as a raw material or an additive of a resist for the fine processing of a semiconductor. SOLUTION: The objective compound is expressed by the formula (one of R to R is OH, one of R to R is OH and the remaining R to R are each H, a 1-6C alkyl or OH), e.g. 4,4'-methylenebis[2- 2-hydroxy-3-(2-hydroxybenzyl)-5- methylbenzyl}-3,6-dimethylphenol]. The compound can be produced by reacting 4,4'-methylenebis[2-(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-3,6- dimethylphenol] with a phenolic compound at a molar ratio of 1:(2-50) in the presence of an acidic catalyst.</description><edition>6</edition><language>eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; APPARATUS THEREFOR ; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; CHEMISTRY ; GENERAL METHODS OF ORGANIC CHEMISTRY ; METALLURGY ; ORGANIC CHEMISTRY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>1997</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970428&DB=EPODOC&CC=JP&NR=H09110758A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970428&DB=EPODOC&CC=JP&NR=H09110758A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ICHIKAWA KOJI</creatorcontrib><creatorcontrib>OZAKI HARUKI</creatorcontrib><title>HEXANUCLEAR NOVOLAC COMPOUND AND ITS PRODUCTION</title><description>PROBLEM TO BE SOLVED: To obtain a new compound useful as a raw material or an additive of a resist for the fine processing of a semiconductor. SOLUTION: The objective compound is expressed by the formula (one of R to R is OH, one of R to R is OH and the remaining R to R are each H, a 1-6C alkyl or OH), e.g. 4,4'-methylenebis[2- 2-hydroxy-3-(2-hydroxybenzyl)-5- methylbenzyl}-3,6-dimethylphenol]. The compound can be produced by reacting 4,4'-methylenebis[2-(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-3,6- dimethylphenol] with a phenolic compound at a molar ratio of 1:(2-50) in the presence of an acidic catalyst.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>APPARATUS THEREFOR</subject><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>CHEMISTRY</subject><subject>GENERAL METHODS OF ORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1997</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND3cI1w9At19nF1DFLw8w_z93F0VnD29w3wD_VzUXAEYs-QYIWAIH-XUOcQT38_HgbWtMSc4lReKM3NoOjmGuLsoZtakB-fWlyQmJyal1oS7xXgYWBpaGhgbmrhaEyMGgAgACZn</recordid><startdate>19970428</startdate><enddate>19970428</enddate><creator>ICHIKAWA KOJI</creator><creator>OZAKI HARUKI</creator><scope>EVB</scope></search><sort><creationdate>19970428</creationdate><title>HEXANUCLEAR NOVOLAC COMPOUND AND ITS PRODUCTION</title><author>ICHIKAWA KOJI ; OZAKI HARUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH09110758A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1997</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>APPARATUS THEREFOR</topic><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>CHEMISTRY</topic><topic>GENERAL METHODS OF ORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ICHIKAWA KOJI</creatorcontrib><creatorcontrib>OZAKI HARUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ICHIKAWA KOJI</au><au>OZAKI HARUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>HEXANUCLEAR NOVOLAC COMPOUND AND ITS PRODUCTION</title><date>1997-04-28</date><risdate>1997</risdate><abstract>PROBLEM TO BE SOLVED: To obtain a new compound useful as a raw material or an additive of a resist for the fine processing of a semiconductor. SOLUTION: The objective compound is expressed by the formula (one of R to R is OH, one of R to R is OH and the remaining R to R are each H, a 1-6C alkyl or OH), e.g. 4,4'-methylenebis[2- 2-hydroxy-3-(2-hydroxybenzyl)-5- methylbenzyl}-3,6-dimethylphenol]. The compound can be produced by reacting 4,4'-methylenebis[2-(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-3,6- dimethylphenol] with a phenolic compound at a molar ratio of 1:(2-50) in the presence of an acidic catalyst.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS THEREFOR CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY GENERAL METHODS OF ORGANIC CHEMISTRY METALLURGY ORGANIC CHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING |
| title | HEXANUCLEAR NOVOLAC COMPOUND AND ITS PRODUCTION |
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