HEXANUCLEAR NOVOLAC COMPOUND AND ITS PRODUCTION

PROBLEM TO BE SOLVED: To obtain a new compound useful as a raw material or an additive of a resist for the fine processing of a semiconductor. SOLUTION: The objective compound is expressed by the formula (one of R to R is OH, one of R to R is OH and the remaining R to R are each H, a 1-6C alkyl or O...

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Bibliographische Detailangaben
Hauptverfasser:	ICHIKAWA KOJI, OZAKI HARUKI
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS THEREFOR CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY GENERAL METHODS OF ORGANIC CHEMISTRY METALLURGY ORGANIC CHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a new compound useful as a raw material or an additive of a resist for the fine processing of a semiconductor. SOLUTION: The objective compound is expressed by the formula (one of R to R is OH, one of R to R is OH and the remaining R to R are each H, a 1-6C alkyl or OH), e.g. 4,4'-methylenebis[2- 2-hydroxy-3-(2-hydroxybenzyl)-5- methylbenzyl}-3,6-dimethylphenol]. The compound can be produced by reacting 4,4'-methylenebis[2-(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-3,6- dimethylphenol] with a phenolic compound at a molar ratio of 1:(2-50) in the presence of an acidic catalyst.