SPIN DRIER FOR LARGE-SIZED SUBSTRATE AND METHOD FOR DRYING LARGE-SIZED SUBSTRATE

PURPOSE: To make drying efficiency higher than when a large-sized substrate is rotated independently and to suppress the generation of staining and unequal drying by disposing a disk of which the surface facing this large-sized substrate is planar to face the substrate on the large-sized substrate....

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SONOBE YUKIO, KOTO SATORU, MAEJIMA TARO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING HEATING LIGHTING MECHANICAL ENGINEERING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF WEAPONS
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Beschreibung
Zusammenfassung:	PURPOSE: To make drying efficiency higher than when a large-sized substrate is rotated independently and to suppress the generation of staining and unequal drying by disposing a disk of which the surface facing this large-sized substrate is planar to face the substrate on the large-sized substrate. CONSTITUTION: The large-sized substrate on a transporting conveyor 9 is transferred and placed on a turn table 10 by a carrying-in arm 13. A cover 29, then, descends to cover a drying chamber and an air cylinder 25 is actuated to lower the disk 21 of which the surface facing the substrate is planar and which is disposed to face the large-sized substrate down to the inter-surface distance to the large-sized substrate. Next, pure water is emitted in the form of a stream from a pure water nozzle at the center of the disk 12 to execute final rinsing prior to drying. After the rinsing is executed for the prescribed period of time, the pure water nozzle is changed over to a gas nozzle and nitrogen or dry air is blown under a pressure of 1 to 3kg/cm , by which the large-sized substrate is dried while the substrate is kept rotated at 1000 to 2000rpm by taking the prevention of jumping out or failure of the large-sized substrate into consideration.