PROJECTION ALIGNER, AND PROJECTION EXPOSURE METHOD

PURPOSE:To provide a projection aligner which can draw an accurate picture with simple structure and can manufacture a semiconductor element with high accuracy, and a projection exposure method. CONSTITUTION:A projection aligner which projects and exposes the image of a photomask 4 on the semiconduc...

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Bibliographische Detailangaben
1. Verfasser:	KURIMOTO KOZO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a projection aligner which can draw an accurate picture with simple structure and can manufacture a semiconductor element with high accuracy, and a projection exposure method. CONSTITUTION:A projection aligner which projects and exposes the image of a photomask 4 on the semiconductor wafer 6 placed on the X-Y stage 10 shifting each independently in X and Y directions, by step and repeat operation, has such constitution as to measure the quantity of yawing of the X-Y stage 10 and rotates the image of a photomask 4 slightly so as to correct the quantity of yawing, centering upon the specified one point in a least a plurality of exposure positions. According to this, semiconductor elements can be manufactured accurately with high throughput without depending upon the accuracy of the shifting guide of the X-Y stage.