POLISHING COMPOSITION AND POLISHING METHOD
PURPOSE:To provide a polishing composition which can increase the polishing speed and delay the deterioration of the polishing agent in the scratch-free mirror surface polish. CONSTITUTION:This polishing composition comprises 2-30 pts.wt. of a polishing material of 0.1-10mum average particle diamete...
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| creator | KATAKAMA TOSHIO OZEKI NORIO NISHIHAMA YUKIO |
| description | PURPOSE:To provide a polishing composition which can increase the polishing speed and delay the deterioration of the polishing agent in the scratch-free mirror surface polish. CONSTITUTION:This polishing composition comprises 2-30 pts.wt. of a polishing material of 0.1-10mum average particle diameter and 1-20 pts.wt. of at least one selected from the group consisting of alkyl sulfate salts and polyoxyethylene monofatty acid esters. The substrate is polished on its surface, as the buff having the polishing composition adhered on its surface is rotated. |
| format | Patent |
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CONSTITUTION:This polishing composition comprises 2-30 pts.wt. of a polishing material of 0.1-10mum average particle diameter and 1-20 pts.wt. of at least one selected from the group consisting of alkyl sulfate salts and polyoxyethylene monofatty acid esters. The substrate is polished on its surface, as the buff having the polishing composition adhered on its surface is rotated.</description><edition>6</edition><language>eng</language><subject>ADHESIVES ; CHEMISTRY ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PERFORMING OPERATIONS ; POLISHES ; POLISHING ; TRANSPORTING</subject><creationdate>1996</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19960213&DB=EPODOC&CC=JP&NR=H0841443A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19960213&DB=EPODOC&CC=JP&NR=H0841443A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KATAKAMA TOSHIO</creatorcontrib><creatorcontrib>OZEKI NORIO</creatorcontrib><creatorcontrib>NISHIHAMA YUKIO</creatorcontrib><title>POLISHING COMPOSITION AND POLISHING METHOD</title><description>PURPOSE:To provide a polishing composition which can increase the polishing speed and delay the deterioration of the polishing agent in the scratch-free mirror surface polish. 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The substrate is polished on its surface, as the buff having the polishing composition adhered on its surface is rotated.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1996</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAK8PfxDPbw9HNXcPb3DfAP9gzx9PdTcPRzUUDI-LqGePi78DCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSSeK8ADwMLE0MTE2NHYyKUAAAn5SSj</recordid><startdate>19960213</startdate><enddate>19960213</enddate><creator>KATAKAMA TOSHIO</creator><creator>OZEKI NORIO</creator><creator>NISHIHAMA YUKIO</creator><scope>EVB</scope></search><sort><creationdate>19960213</creationdate><title>POLISHING COMPOSITION AND POLISHING METHOD</title><author>KATAKAMA TOSHIO ; OZEKI NORIO ; NISHIHAMA YUKIO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0841443A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1996</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>KATAKAMA TOSHIO</creatorcontrib><creatorcontrib>OZEKI NORIO</creatorcontrib><creatorcontrib>NISHIHAMA YUKIO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KATAKAMA TOSHIO</au><au>OZEKI NORIO</au><au>NISHIHAMA YUKIO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLISHING COMPOSITION AND POLISHING METHOD</title><date>1996-02-13</date><risdate>1996</risdate><abstract>PURPOSE:To provide a polishing composition which can increase the polishing speed and delay the deterioration of the polishing agent in the scratch-free mirror surface polish. CONSTITUTION:This polishing composition comprises 2-30 pts.wt. of a polishing material of 0.1-10mum average particle diameter and 1-20 pts.wt. of at least one selected from the group consisting of alkyl sulfate salts and polyoxyethylene monofatty acid esters. The substrate is polished on its surface, as the buff having the polishing composition adhered on its surface is rotated.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING TRANSPORTING |
| title | POLISHING COMPOSITION AND POLISHING METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-04T09%3A50%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KATAKAMA%20TOSHIO&rft.date=1996-02-13&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH0841443A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |