POLISHING COMPOSITION AND POLISHING METHOD

PURPOSE:To provide a polishing composition which can increase the polishing speed and delay the deterioration of the polishing agent in the scratch-free mirror surface polish. CONSTITUTION:This polishing composition comprises 2-30 pts.wt. of a polishing material of 0.1-10mum average particle diamete...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KATAKAMA TOSHIO, OZEKI NORIO, NISHIHAMA YUKIO
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a polishing composition which can increase the polishing speed and delay the deterioration of the polishing agent in the scratch-free mirror surface polish. CONSTITUTION:This polishing composition comprises 2-30 pts.wt. of a polishing material of 0.1-10mum average particle diameter and 1-20 pts.wt. of at least one selected from the group consisting of alkyl sulfate salts and polyoxyethylene monofatty acid esters. The substrate is polished on its surface, as the buff having the polishing composition adhered on its surface is rotated.