GLASS SUBSTRATE EXCELLENT IN CHEMICAL RESISTANCE

PURPOSE:To obtain a glass substrate not substantially contg. alkali metal oxides, excellent in chemical resistance, especially resistance to buffered hydrofluoric acid and preventing the occurrence of bubbles, foreign matter and stria at the time of melting. CONSTITUTION:This glass substrate consist...

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1. Verfasser:	ONODA TAKUHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a glass substrate not substantially contg. alkali metal oxides, excellent in chemical resistance, especially resistance to buffered hydrofluoric acid and preventing the occurrence of bubbles, foreign matter and stria at the time of melting. CONSTITUTION:This glass substrate consists of, by weight 50-65% SiO2, 7-19% Al2O3, 3-15% B2O3, 2-18% CaO, 10.5-25% BaO, 0-10% SrO, 0-10% ZnO and 0.1-4% ZrO2, and alkali metal oxides, MgO and PbO are not substantially contained.