METHOD AND UNIT FOR PHOTOMETRICALLY MEASURING POLYMER MATERIAL FILM
PURPOSE: To provide a method for photometrically measuring polymer film by which the reaction of each layer can be measured separately even during a reaction process at the time of photometrically measuring the reaction of each layer when a multilayered or single-layered film is caused to react by u...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE: To provide a method for photometrically measuring polymer film by which the reaction of each layer can be measured separately even during a reaction process at the time of photometrically measuring the reaction of each layer when a multilayered or single-layered film is caused to react by using a reaction driving force. CONSTITUTION: A polymer film constituting a lower layer is placed on a first substrate 2 as a first sample 1 and another polymer film constituting an upper layer is placed on a second substrate 7 as a second sample 6. Ultraviolet rays 12 from an ultraviolet-ray source 11 pass through the first sample 1 after passing through the second sample 6. First infrared rays 14 from a first infrared-ray source 13 are incident on a first detector 15 after passing through the first sample 1 and second infrared rays 17 from a second infrared-ray source 16 are incident on a second detector 18 after passing through the second sample 6. The output signals of the detectors 15 and 18 are inputted to a spectrophotometer for transmitted light. |
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