POLISHING DEVICE

PURPOSE: To allow polishing and cleaning without using polishing agents and detergents by constituting the subject device in such a manner that works charged into the central part of an upper surface plate from a tank, etc., are moved and aligned by the centrifugal force accompanying the rotation of a rotary plate and that the works are polished between a cleaning and polishing section of the upper surface plate and a cleaning and polishing section of the rotary plate. CONSTITUTION: The works are moved toward the guiding section 9 of the upper surface plate 7 by the centrifugal force while rotating force is applied thereon by the rotary plate 1 when the works from a tank, etc., are charged from a central charge port 8 of the upper surface plate 7 and are placed on the rotary plate 1. The works are then aligned and are admitted between the stationary brush 13 of the front surface plate 7 and the rotary brush 10 of the rotary plate 1. The dirt and dust sticking to the front and rear surfaces and flanks of the works are polished away by these brushes 10, 13 during the movement. The works arriving at the outer periphery of the rotary plate 1 are released onto a chute from a release section along an outer peripheral guiding section 12. On the other hand, the dirt and dust sticking to the brushes 10, 13 are desorbed by rubbing of the brushes 10, 13 against each other and are dropped through the meshes of the chute.