VAPOR GROWTH APPARATUS

PURPOSE: To provide a vapor growth apparatus by which a change in a flow velocity in the width direction can be suppressed on respective faces of a polygonal susceptor without increasing the flow rate of a source gas. CONSTITUTION: A polygonal susceptor 4 is arranged inside a vertical reaction container. In a state that wafers 5 have been arranged on respective faces 4a of the polygonal susceptor 4, the polygonal susceptor 4 is turned around its axial center, a source gas is made to flow to the respective faces 4a of the polygonal susceptor 4 from the upper end part of the reaction container, and a vapor growth operation is performed to the surface of the respective wafers 5. A flow-velocity equalization means 8 which reduces a change in the flow velocity in the width direction of the source gas flowing to the respective faces 4a is installed on the side of the susceptor 4. The flow-velocity equalization means 8 is constituted of flow-velocity equalization protuberance parts 9 which are installed so as to protrude at upper parts of the respective faces 4a of the polygonal susceptor 4 while the center in the width direction is used as the center.