PHOTORESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a composition which is useful as a photoresist, particularly, as a DUV photoresist and is excellent in preserving and processing stability and has high resolution. SOLUTION: This composition is composed of (A) at least a single polymer, for example, poly[4-(l ethoxy...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KAARUUROORENTSU MERUTESUDORUFU, HANSUUTOOMASU SHIYAHATO, PASUKUAARE ARUFUREDO FUARUCHIINIYO, NORUBERUTO MIYUNTSUERU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
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